Position Expired
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NPI Engineering Intern - Advanced CMOS Device
ASML
<div class="content-intro"><p> </p>
<p><strong>Step into a career with ASM, where cutting edge technology meets collaborative culture. </strong></p>
<p>For over 55 years ASM has been ahead of what’s next, at the forefront of innovation and what’s technologically possible. With more than 4,500 ASMers representing 70 nationalities, our people and our advanced semiconductor devices are playing a crucial role in trends such as 5G, cloud computing, AI, and autonomous driving. But we’re more than just a tech company. We value diversity, inclusion and sustainability as we strive to make a positive impact on the world. Our development programs help support your growth, shaping your future and pushing the boundaries of innovation to unleash potential. </p></div><p><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun" data-ccp-charstyle-defn="{"ObjectId":"ac0262f4-8a9e-5820-b908-2d943c5f7113|1","ClassId":1073872969,"Properties":[201342446,"1",201342447,"5",201342448,"1",201342449,"1",469777841,"Arial",469777842,"",469777843,"Arial",469777844,"Arial",201341986,"1",469769226,"Arial",268442635,"22",469775450,"normaltextrun",201340122,"1",134233614,"true",469778129,"normaltextrun",335572020,"1",469778324,"Default Paragraph Font"]}">About the Internship </span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="eop" data-ccp-charstyle-defn="{"ObjectId":"920dbcde-2834-5e15-a5fa-062170b236ba|1","ClassId":1073872969,"Properties":[201342446,"1",201342447,"5",201342448,"1",201342449,"1",469777841,"Arial",469777842,"",469777843,"Arial",469777844,"Arial",201341986,"1",469769226,"Arial",268442635,"22",469775450,"eop",201340122,"1",134233614,"true",469778129,"eop",335572020,"1",469778324,"Default Paragraph Font"]}"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335559738":0,"335559739":0,"335559740":240}"> </span></p>
<p><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Our </span></span><span data-contrast="none"><span data-ccp-charstyle="normaltextrun">Summer </span></span><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">internship provides </span><span data-ccp-charstyle="normaltextrun">an </span><span data-ccp-charstyle="normaltextrun">experience in the fast-paced and exciting semiconductor industry. Our interns will work alongside industry projects and gain valuable insights into our core engineering roles. This program is designed to grow and shape the industry leaders of tomorrow, offering a chance to learn, develop and build the skills needed for a successful career in the semiconductor field. </span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335557856":16777215,"335559738":0,"335559739":0,"335559740":240}"> </span></p>
<p> </p>
<p><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">What to expect</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335559738":0,"335559739":0,"335559740":240}"> </span></p>
<p><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">This position is a paid internship</span></span><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">. The duration will be in Hsin-Chu (Hybrid Model)</span></span><strong><span data-contrast="none"><span data-ccp-charstyle="normaltextrun">.</span></span></strong><span data-contrast="none"><span data-ccp-charstyle="normaltextrun"> </span></span><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Our internship program is for students who are actively enrolled in a full-time academic program. Recent graduates seeking employment after graduation and not returning to school should apply for our Early Career opportunities. </span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335557856":16777215,"335559738":0,"335559739":0,"335559740":240}"> </span></p>
<p> </p>
<p><strong>Job's mission</strong></p>
<p><span data-contrast="auto">We are seeking a highly motivated </span><strong><span data-contrast="auto">Engineering Intern</span></strong><span data-contrast="auto"> to support research and analysis of </span><strong><span data-contrast="auto">advanced CMOS transistor electrical behavior</span></strong><span data-contrast="auto">, with a focus on how </span><strong><span data-contrast="auto">channel materials, interfacial layers (IL), and High</span></strong>‑<strong><span data-contrast="auto">k Metal Gate (HKMG) stacks</span></strong><span data-contrast="auto"> influence device performance and reliability.</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></p>
<p><span data-contrast="auto">This internship centers on </span><strong><span data-contrast="auto">deep technical literature review and knowledge synthesis</span></strong><span data-contrast="auto">. The intern will analyze published research to understand the physical mechanisms and material–device interactions that govern electrical characteristics in advanced logic devices. The results will be consolidated into a structured knowledge base to support ongoing and future device and process development activities.</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></p>
<p><span data-contrast="auto">This role is well suited for </span><strong><span data-contrast="auto">PhD students</span></strong><span data-contrast="auto"> with strong backgrounds in semiconductor physics, device engineering, or materials science who are interested in advanced device architectures and gate stack engineering.</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></p>
<p> </p>
<p><strong><span data-contrast="auto">What You Will Do</span></strong><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></p>
<ul>
<li><span data-contrast="auto">Conduct a structured review of academic journals and conference publications related to advanced CMOS devices</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Analyze how </span><strong><span data-contrast="auto">channel material properties</span></strong><span data-contrast="auto"> (e.g., band structure, strain, surface roughness, scattering mechanisms) impact: </span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span>
<ul>
<li><span data-contrast="auto">Carrier mobility</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Drive current and leakage</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Device reliability</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
</li>
<li><span data-contrast="auto">Study the role of </span><strong><span data-contrast="auto">interfacial layers (IL)</span></strong><span data-contrast="auto"> as thickness scales to sub</span>‑<span data-contrast="auto">nanometer regimes, including: </span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span>
<ul>
<li><span data-contrast="auto">Material quality and defect characteristics</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Trade</span>‑<span data-contrast="auto">offs between scaling, performance, and long</span>‑<span data-contrast="auto">term stability</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
</li>
<li><span data-contrast="auto">Evaluate the impact of </span><strong><span data-contrast="auto">High</span></strong>‑<strong><span data-contrast="auto">k Metal Gate (HKMG) stacks</span></strong><span data-contrast="auto">, including: </span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span>
<ul>
<li><span data-contrast="auto">High</span>‑<span data-contrast="auto">k dielectric and metal gate material choices</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Gate leakage behavior and threshold voltage (Vt) tuning</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Dipole formation, oxygen vacancy effects, and process variability</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
</li>
<li><span data-contrast="auto">Integrate findings across channel, IL, and HKMG to describe </span><strong><span data-contrast="auto">cross</span></strong>‑<strong><span data-contrast="auto">layer interaction effects</span></strong><span data-contrast="auto"> on device performance</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Organize and document findings in a clear, structured, and reusable format for technical discussion</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<p> </p>
<p><strong><span data-contrast="auto">Deliverables</span></strong><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></p>
<ul>
<li><span data-contrast="auto">A comprehensive written report describing how channel materials, IL properties, and HKMG stacks influence electrical performance and reliability in advanced CMOS devices</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">A summary presentation suitable for technical reviews</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">A curated and organized database of analyzed literature</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<p> </p>
<p><strong><span data-contrast="auto">What You Will Gain</span></strong><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></p>
<ul>
<li><span data-contrast="auto">Hands</span>‑<span data-contrast="auto">on experience analyzing </span><strong><span data-contrast="auto">state</span></strong>‑<strong><span data-contrast="auto">of</span></strong>‑<strong><span data-contrast="auto">the</span></strong>‑<strong><span data-contrast="auto">art and beyond</span></strong>‑<strong><span data-contrast="auto">CMOS device technologies</span></strong><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Deep exposure to </span><strong><span data-contrast="auto">device physics and gate stack engineering challenges</span></strong><span data-contrast="auto"> at advanced technology nodes</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Experience in translating academic research into insights relevant for industrial R&D</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Close interaction with experienced engineers and researchers in advanced device and materials development</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<p> </p>
<p><strong>What we are looking for</strong></p>
<ul>
<li><span data-contrast="auto">Currently pursuing a </span><strong><span data-contrast="auto">PhD degree</span></strong><span data-contrast="auto"> in: </span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span>
<ul>
<li><span data-contrast="auto">Electrical Engineering</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Materials Science</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Applied Physics</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Solid</span>‑<span data-contrast="auto">State or Semiconductor</span>‑<span data-contrast="auto">related disciplines</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
</li>
<li><span data-contrast="auto">Strong foundation in </span><strong><span data-contrast="auto">semiconductor physics and device engineering</span></strong><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Ability to read, analyze, and synthesize complex technical literature</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Strong written communication skills in English</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<p> </p>
<p><strong>What sets you apart</strong></p>
<ul>
<li><span data-contrast="auto">Background in </span><strong><span data-contrast="auto">CMOS device physics</span></strong><span data-contrast="auto">, gate stack engineering, or reliability</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Familiarity with concepts such as mobility degradation, interface traps, high</span>‑<span data-contrast="auto">k dielectrics, or metal gate work function engineering</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
<li><span data-contrast="auto">Prior research experience in device, materials, or process technology</span><span data-ccp-props="{"201341983":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<p> </p>
<p><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun" data-ccp-charstyle-defn="{"ObjectId":"ac0262f4-8a9e-5820-b908-2d943c5f7113|1","ClassId":1073872969,"Properties":[201342446,"1",201342447,"5",201342448,"1",201342449,"1",469777841,"Arial",469777842,"",469777843,"Arial",469777844,"Arial",201341986,"1",469769226,"Arial",268442635,"22",469775450,"normaltextrun",201340122,"1",134233614,"true",469778129,"normaltextrun",335572020,"1",469778324,"Default Paragraph Font"]}">Benefits</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="eop" data-ccp-charstyle-defn="{"ObjectId":"920dbcde-2834-5e15-a5fa-062170b236ba|1","ClassId":1073872969,"Properties":[201342446,"1",201342447,"5",201342448,"1",201342449,"1",469777841,"Arial",469777842,"",469777843,"Arial",469777844,"Arial",201341986,"1",469769226,"Arial",268442635,"22",469775450,"eop",201340122,"1",134233614,"true",469778129,"eop",335572020,"1",469778324,"Default Paragraph Font"]}"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335559738":0,"335559739":0,"335559740":240}"> </span></p>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="13" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">As an intern, you will gain hands-on experience by working on industry-related projects, providing you with valuable exposure to real-world processes and the opportunity to apply your skills in a professional setting.</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335557856":16777215,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="14" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Learn from the Best</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">: Get the chance to work alongside world-class engineers and industry leaders who are shaping the future of technology—your personal dream team of innovators!</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335557856":16777215,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="15" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Step into the Future</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">: Dive into one of the fastest-growing industries on the planet. From AI to 5G, </span><span data-ccp-charstyle="normaltextrun">you'll</span><span data-ccp-charstyle="normaltextrun"> be right at the heart of the tech revolution.</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="16" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Hands-On with Cutting-Edge Tech</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">: Experience the latest and greatest in semiconductor design, testing, and fabrication. </span><span data-ccp-charstyle="normaltextrun">You’ll</span><span data-ccp-charstyle="normaltextrun"> be working with the coolest tools and gadgets out there.</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="17" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Network Like a Pro</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">: Meet and connect with brilliant minds from all over the </span><span data-ccp-charstyle="normaltextrun">world, and</span><span data-ccp-charstyle="normaltextrun"> make friendships that could open doors to amazing future career opportunities.</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335557856":16777215,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="18" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Make a Real Impact</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">: Work on groundbreaking projects that power everything from smartphones to self-driving cars. Your contributions will help shape tomorrow’s world.</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul>
<ul>
<li data-leveltext="" data-font="Symbol" data-listid="19" data-list-defn-props="{"335552541":1,"335559685":720,"335559991":360,"469769226":"Symbol","469769242":[8226],"469777803":"left","469777804":"","469777815":"multilevel"}" data-aria-posinset="1" data-aria-level="1"><strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">Challenge Your Mind</span></span></strong><span data-contrast="auto"><span data-ccp-charstyle="normaltextrun">: Sharpen your problem-solving skills as you take on real-world challenges, </span><span data-ccp-charstyle="normaltextrun">pushing</span><span data-ccp-charstyle="normaltextrun"> boundaries and </span><span data-ccp-charstyle="normaltextrun">thinking outside the box</span><span data-ccp-charstyle="normaltextrun">.</span><span data-ccp-charstyle="eop"> </span></span><span data-ccp-props="{"134233117":false,"134233118":false,"201341983":0,"335557856":16777215,"335559685":1080,"335559731":0,"335559738":0,"335559739":0,"335559740":240}"> </span></li>
</ul><div class="content-conclusion"><p><strong>Apply today to be part of what’s next.</strong></p>
<p>We make the tech that enables the chips in devices which improve lives around the world. We do this with an eye to the future, pushing the boundaries of what’s possible through cutting-edge innovation, and driving the next wave of technological breakthroughs that shape how we live, work, and connect.</p>
<p class="x_elementToProof">To learn more about ASM, find us at <a href="https://www.asm.com/" target="_blank">asm.com</a> and on <a href="https://www.linkedin.com/company/asm/" target="_blank">LinkedIn</a>, <a href="https://www.facebook.com/ASMOfficialCompany" target="_blank">Facebook</a>, <a href="https://www.instagram.com/asmofficialcompany/" target="_blank">Instagram,</a> <a href="https://twitter.com/ASMofficialco" target="_blank">X </a>and <a href="https://www.youtube.com/c/ASM_Official" target="_blank">YouTube</a>.</p>
<hr>
<p class="x_elementToProof"><em>ASM is an equal opportunity employer and considers qualified applicants for employment without regard to race, color, religion, age, nationality, social or ethnic origin, sexual orientation, gender, gender identify or expression, marital status, pregnancy, political affiliation, disability, genetic information, veteran status, or any other characteristic protected by law.</em></p></div>
Qualifications
- Department: SU1.BU3.Advanced Tech Develop
Benefits
- Offices: Hsinchu (ASM Front-end Taiwan)
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